Wire
Ø 0.01–2 mm · 4N
View details →Gold · 4N — Sputtering PVD and power contacts
High-purity gold discs and targets (Au ≥ 99.99% — 4N) for cathodic sputtering (PVD). Manufactured with controlled fine-grain microstructure for uniform erosion rates. Available bonded to Cu backing plate or freestanding.
| Diameter | Ø 25–300 mm (standard and custom) |
|---|---|
| Target thickness | 3–10 mm |
| Purity | Au ≥ 99.99% (4N) |
| Grain size | < 200 µm (optimized rolling) |
| Backing plate | Unbacked, Cu or Mo depending on the PVD system |
| Bonding process | Indium, diffusion, or mechanical |
RoHS 2REACHØ 0.01–2 mm · 4N
View details →e 0.025–2 mm · 4N
View details →For electroplating and PVD
View details →Tell us dimensions, grade and quantity. Technical response in less than 24 h.