Wire
Ø 0.01–2 mm · 4N
Details ansehen →Gold · 4N — Sputtering PVD and power contacts
High-purity gold discs and targets (Au ≥ 99.99% — 4N) for cathodic sputtering (PVD). Manufactured with controlled fine-grain microstructure for uniform erosion rates. Available bonded to Cu backing plate or freestanding.
| Diameter | Ø 25–300 mm (estándar y a medida) |
|---|---|
| Target thickness | 3–10 mm |
| Purity | Au ≥ 99,99 % (4N) |
| Grain size | < 200 µm (laminado optimizado) |
| Backing plate | Libre, Cu o Mo según sistema PVD |
| Bonding process | Indio, difusión o mecánico |
RoHS 2REACHØ 0.01–2 mm · 4N
Details ansehen →e 0.025–2 mm · 4N
Details ansehen →For electroplating and PVD
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